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Metrology and characterization of SU-8 microstructures using autofluorescence emission
Journal of Micromechanics and Microengineering ( IF 2.3 ) Pub Date : 2021-03-04 , DOI: 10.1088/1361-6439/abe7c9
Pradeep Kumar Ramkumar 1 , Corey M Rountree 1 , Laxman Saggere 1 , John D Finan 1
Affiliation  

Sophisticated three-dimensional microstructures fabricated using the negative tone SU-8 photoresist are used in many biomedical and microfluidic applications. Scanning electron microscopy (SEM) and profilometry are commonly used metrological techniques for the dimensional characterization of fabricated SU-8 microstructures but are not viable for non-destructive measurements and characterization of subsurface features like hidden microchannels. In this study, we report a unique methodology for the non-destructive dimensional characterization of SU-8 microstructures using the emitted autofluorescence radiation from fabricated SU-8 microstructures to generate depth profiles. The relationship between autofluorescence emission intensities and the thicknesses of the microstructures measured using SEM was determined and used to characterize the dimensions of unknown SU-8 microstructures based on their autofluorescence intensities. Lateral dimensions were also measured. This relationship was used to create highly accurate depth profiles for different types of microstructures including hidden subsurface features. These results were validated by comparison with SEM. The results suggest a feasible and accurate non-destructive, low cost, metrological technique to characterize SU-8 surface and subsurface microstructures using autofluorescence emission intensities.



中文翻译:

使用自发荧光发射的 SU-8 微结构的计量和表征

使用负色调 SU-8 光刻胶制造的复杂 3D 微结构用于许多生物医学和微流体应用。扫描电子显微镜 (SEM) 和轮廓测量法是常用的计量技术,用于制造 SU-8 微结构的尺寸表征,但不适用于非破坏性测量和隐藏微通道等地下特征的表征。在这项研究中,我们报告了一种独特的方法,用于 SU-8 微结构的非破坏性尺寸表征,使用来自制造的 SU-8 微结构的自发荧光辐射来生成深度剖面。确定了自发荧光发射强度与使用 SEM 测量的微结构厚度之间的关系,并根据其自发荧光强度用于表征未知 SU-8 微结构的尺寸。还测量了横向尺寸。这种关系用于为不同类型的微观结构(包括隐藏的地下特征)创建高度准确的深度轮廓。这些结果通过与 SEM 的比较得到验证。结果提出了一种可行且准确的非破坏性、低成本、计量技术,可使用自发荧光发射强度来表征 SU-8 表面和次表面微结构。这种关系用于为不同类型的微观结构(包括隐藏的地下特征)创建高度准确的深度轮廓。这些结果通过与 SEM 的比较得到验证。结果提出了一种可行且准确的非破坏性、低成本、计量技术,可使用自发荧光发射强度来表征 SU-8 表面和次表面微结构。这种关系用于为不同类型的微观结构(包括隐藏的地下特征)创建高度准确的深度轮廓。这些结果通过与 SEM 的比较得到验证。结果提出了一种可行且准确的非破坏性、低成本、计量技术,可使用自发荧光发射强度来表征 SU-8 表面和次表面微结构。

更新日期:2021-03-04
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