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Preferential sputtering of metal oxide mixture thin films
Journal of Vacuum Science & Technology A ( IF 2.9 ) Pub Date : 2021-01-28 , DOI: 10.1116/6.0000799
Mathias Mende 1 , Florian Carstens 1, 2 , Henrik Ehlers 1, 2 , Detlev Ristau 1, 2
Affiliation  

Metal oxide mixture materials enable the production of dielectric multilayer coatings for highest power laser applications. During thin film deposition, when using sputtering techniques in combination with composite target materials, preferential sputtering occurs on the target surface. The quantitative analysis of the mixture thin film composition, usually performed by ion beam based depth profiling methods, is also affected by preferential sputtering. To gain a deeper understanding, the atomic composition variation of sputtered mixture material surfaces is calculated applying the Monte Carlo simulation program tridyn. The simulation results are compared to the atomic composition gradient measured via depth profiling x-ray photoelectron spectroscopy for mixture thin films composed of HfO2, Sc2O3, Al2O3, and SiO2. The deviations between the experimental and simulated data are discussed with respect to the different mixture material combinations.

中文翻译:

优先溅射金属氧化物混合物薄膜

金属氧化物混合材料能够生产用于最高功率激光应用的介电多层涂层。在薄膜沉积过程中,当将溅射技术与复合靶材结合使用时,在靶材表面会发生优先溅射。通常通过基于离子束的深度轮廓分析方法进行的混合物薄膜组合物的定量分析也受到优先溅射的影响。为了加深理解,使用蒙特卡罗模拟程序tridyn计算了溅射混合物材料表面的原子组成变化。将模拟结果与通过深度剖析X射线光电子能谱法测量的由HfO 2组成的混合薄膜的原子组成梯度进行了比较,Sc 2 O 3,Al 2 O 3和SiO 2。关于不同的混合材料组合,讨论了实验数据和模拟数据之间的偏差。
更新日期:2021-03-05
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