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Synthesis of Silicon Sulfide by Using CS 2 Gas
Metallurgical and Materials Transactions B ( IF 3 ) Pub Date : 2021-03-03 , DOI: 10.1007/s11663-021-02103-y
Ryosuke O. Suzuki , Yuta Yashima , Takumi Kaneko , Eltefat Ahmadi , Tatsuya Kikuchi , Takafumi Watanabe , Genki Nogami

Silicon sulfide (SiS2) was synthesized from Si, SiC, Si3N4, and a eutectic Al-Si liquid. An Ar-CS2 gas mixture, after bubbling through liquid CS2, was passed over pulverized Si, SiC, Si3N4, or a eutectic Al-Si alloy liquid. White, needle-shaped SiS2 was precipitated as a single phase on the colder downstream surface when Si powder in a SiO2 liner was heated over 1273 K. This deposition mechanism involves a reaction between Si and CS2 to form SiS2, with the vaporization of SiS(g) and deposition as SiS2(s) from SiS(g) and S2(g). Quartz was unaffected by the reaction gases. Notably, Si, SiC, Si3N4, and the eutectic Al-Si liquid were found to be suitable sources for SiS2 synthesis, although this was suppressed owing to Al2S3 formation on the latter.



中文翻译:

CS 2气合成硫化硅

由Si,SiC,Si 3 N 4和共晶Al-Si液体合成了硫化硅(SiS 2)。在通过液体CS 2鼓泡后,将Ar-CS 2气体混合物通过粉化的Si,SiC,Si 3 N 4或共晶Al-Si合金液体。当将SiO 2衬里的Si粉加热到1273 K以上时,白色针状SiS 2以单相形式沉淀在较冷的下游表面上。这种沉积机理涉及Si和CS 2之间的反应以形成SiS 2, SiS(g)的汽化并从SiS(g)和S中沉积为SiS 2(s)2(g)。石英不受反应气体的影响。值得注意的是,发现Si,SiC,Si 3 N 4和低共熔Al-Si液体是SiS 2合成的合适来源,尽管由于在后者上形成了Al 2 S 3而被抑制了。

更新日期:2021-03-04
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