We have investigated structural, optical, and electrical properties of ZnO:Cu films deposited by ultrafast spray technique at 450 °C for 30 s. Cu concentration in the ZnO system was varied from 0 at.% to 2.5 at.%, as detected by X-ray fluorescence spectroscopy. From the structural analysis, X-ray diffraction patterns show that (100), (002), and (101) planes are observed in pure ZnO. By inserting a Cu concentration of 2 at.% or higher, the (100) and (101) planes entirely disappear, and the crystal is strongly oriented in (002) plane. The average grain size of the films increases from 113.6 nm to 155.8 nm by increasing the Cu content, as observed by scanning electron microscopy. Furthermore, current-voltage (I–V) characteristics show that the 1.5 at.% Cu concentration has the highest UV sensitivity. Such behavior may be originated from carrier trapping under the dark and de-trapping under ultraviolet illumination, as analyzed using UV–Vis, photoluminescence, and FTIR spectroscopy techniques. This interesting result will be confirmed through optical properties analysis. This result is important for the development of a mass-scale UV detector based on ZnO film with short fabrication time and improved functionality.

我们已经研究了通过超快喷涂技术在450°C下沉积30 s的ZnO：Cu膜的结构，光学和电学性质。通过X射线荧光光谱法检测到，ZnO系统中的Cu浓度从0原子％变化到2.5原子％。根据结构分析，X射线衍射图表明在纯ZnO中观察到（100），（002）和（101）平面。通过插入2at。％或更高的Cu浓度，（100）和（101）平面完全消失，并且晶体在（002）平面中强烈取向。如通过扫描电子显微镜观察到的，通过增加Cu含量，膜的平均晶粒尺寸从113.6nm增加到155.8nm。此外，电流-电压（IV）特性表明1.5 at。％的Cu浓度具有最高的UV敏感性。这种行为可能是由于使用紫外可见，光致发光和FTIR光谱分析技术而在黑暗中捕获载流子，而在紫外线照射下解吸引起的。这一有趣的结果将通过光学性质分析得到证实。这一结果对于开发基于ZnO薄膜的大规模紫外检测器具有重要意义，该检测器制造时间短，功能性强。