In this paper \(\hbox {CH}_4\)/\(\hbox {H}_2\) gas flow rate effect on polycrystalline diamond deposition was studied using a time-series exposure technique of modulated induction thermal plasma (M-ITP) and non-modulated induction thermal plasma (NM-ITP). The M-ITP was used to make nucleation of diamond particles in the first stage, and then non-modulated ITP was used to grow diamond particles in the next stage. The diamond films fabricated after exposure by M-ITP and then by NM-ITP were studied in terms of morphology and constituents. Experimental results showed that higher \(\hbox {CH}_4\)/\(\hbox {H}_2\) gas flow rate condition to 0.1/10 slpm provided a higher deposition rate of polycrystalline diamond film. This result implied that higher \(\hbox {CH}_4\)/\(\hbox {H}_2\) gas flow rate would give a higher neutral hydrocarbon fluxes onto the substrate, which was also supported from the numerical simulation model.

本文采用调制感应热等离子体（M-ITP）的时间序列曝光技术，研究了\（\ hbox {CH} _4 \） / \（\ hbox {H} _2 \）气体流量对多晶金刚石沉积的影响。 ）和非调制感应热等离子体（NM-ITP）。在第一阶段中，M-ITP用于使金刚石颗粒成核，然后在下一阶段中，使用非调制ITP来生长金刚石颗粒。研究了通过M-ITP然后通过NM-ITP曝光后制作的金刚石膜的形态和成分。实验结果表明，较高的\（\ hbox {CH} _4 \） / \（\ hbox {H} _2 \）在0.1 / 10slpm的气体流速条件下，提供了更高的多晶金刚石膜沉积速率。该结果表明，较高的\（\ hbox {CH} _4 \） / \（\ hbox {H} _2 \）气体流速将赋予基材较高的中性烃通量，这也得到了数值模拟模型的支持。