A novel integrated sensor for the simultaneous measurement of layer refractive index and thickness based on evanescent fields is proposed. The theoretical limits for the accuracy of the sensor were examined for the example of a ${\mathrm{TiO}}_2$ layer. The influence of production tolerance on the accuracy was evaluated. In the experimental part of this work, a sensor chip containing nanowire and nanorib waveguides realized in silicon on insulator technology was used to demonstrate the detection of refractive index and thickness of a ${\mathrm{TiO}}_2$ atomic layer deposition (ALD) layer.

中文翻译：

---

n集成瞬逝场传感器，可同时测量层的折射率和厚度

提出了一种基于integrated逝场同时测量层的折射率和厚度的新型集成传感器。以传感器为例，研究了传感器精度的理论极限。${\mathrm{二氧化钛}}_{\mathrm{2个}}$层。评估了生产公差对精度的影响。在这项工作的实验部分，使用包含以绝缘体上硅技术实现的纳米线和纳米肋波导的传感器芯片来演示检测折射率和厚度的方法。${\mathrm{二氧化钛}}_{\mathrm{2个}}$ 原子层沉积（ALD）层。