We report a novel high-k hybrid material synthesized at low temperature using a simple sol-gel derived method compatible with organic large-area application. The homogeneous cross-linked organic-inorganic dielectric film is achieved by solution process and densified at 100 °C. For the synthesis, styrene and zirconium isopropoxide are used as polystyrene and ZrO₂ source, respectively. Also, the 3-trimetoxy-silyl-propyl-methacrylate was used as a coupling agent to link organic and inorganic phases. The hybrid films were deposited by dip coating and densified in-situ by polymerization and polycondensation of the organic and inorganic components. The hybrid materials were analyzed by FTIR, XPS, and TGA measurements to confirm the formation of the cross-linked hybrid material. Optical T and R spectroscopy, AFM, and SEM images demonstrated their optical properties, smooth surface, thickness, and high-quality films. The dielectric constant of 9.2 and leakage current around 10⁻⁷ A/cm² was determined by analyzing the MIM capacitors electrical response, fabricated with the hybrid films as the insulator layer.

我们报告了一种新型的高k杂化材料，该材料在低温下使用与有机大面积应用兼容的简单溶胶-凝胶衍生方法合成。均质的交联有机-无机介电薄膜通过固溶工艺获得，并在100°C下致密化。对于合成，苯乙烯和异丙醇锆用作聚苯乙烯和ZrO ₂来源。另外，使用3-三甲氧基-甲硅烷基-丙基-甲基丙烯酸酯作为偶联剂来连接有机相和无机相。通过浸涂沉积杂化膜，并通过有机和无机组分的聚合和缩聚原位致密化。通过FTIR，XPS和TGA测量分析杂化材料，以确认交联杂化材料的形成。光学T和R光谱，AFM和SEM图像证明了它们的光学特性，光滑的表面，厚度和高质量的薄膜。通过分析以混合膜作为绝缘层制造的MIM电容器的电响应，可以确定介电常数9.2和泄漏电流约为10 ^-7 A / cm ²。