Samples of ZnO/TiO₂ bilayer films with various layer thickness were fabricated by atomic layer deposition (ALD). The X-ray diffraction (XRD) patterns revealed the absence of sharp peaks and confirms the amorphous nature of the samples under study. The absorption spectra of ZnO/TiO₂ for the three samples were obtained in view of incident wavelength range (350–700 nm). The absorption spectra were used to determine the optical energy band gap. The experimental results show that the direct optical band gap (E_g) grown on glass substrate was obviously affected by the increase of the number of ZnO/TiO₂ bilayers and found to decrease from (3.45 to 2.96 eV). The transition power factor (P_F) for the three samples was applied to confirm the direct optical transition. A suitable relationship between the linear refractive index (n₀) and the optical energy band gap (E_g) determined from the experimental and theoretical data was proposed for providing good basis for predication the metallization and polarizability criterion and other related parameters, such as optical dielectric constant and electrical susceptibility. The deep analysis of the studied properties, based on the variation of the number of the bilayer of ZnO/TiO₂, makes the incorporation of these two materials promising candidates in various optoelectronic applications and solar cell devices.

通过原子层沉积（ALD）制备了具有不同层厚的ZnO / TiO ₂双层薄膜样品。X射线衍射（XRD）模式显示不存在尖峰，并证实了所研究样品的无定形性质。鉴于入射波长范围（350-700 nm），获得了三个样品的ZnO / TiO ₂的吸收光谱。吸收光谱用于确定光能带隙。实验结果表明，在玻璃基板上生长的直接光学带隙（E _g）明显受到ZnO / TiO ₂双层数的增加的影响，并从（3.45 eV）降低到2.96 eV。过渡功率因数（P _F）用于三个样品，以确认直接光学跃迁。提出了由实验和理论数据确定的线性折射率（n ₀）与光学能带隙（E _g）之间的适当关系，为预测金属化和极化率准则及其他相关参数（如光学性质）提供了良好的基础。介电常数和电化率。基于ZnO / TiO ₂双层数的变化，对所研究性能的深入分析，使这两种材料的结合有望在各种光电应用和太阳能电池器件中成为候选材料。