Diverse wetting contrasts of binary wettability patterns in nature have inspired a versatile platform for microfluidics manipulation. To date, nevertheless, building a binary wettability patterned micro/nano structure with highly ordered configuration has inevitably brought wettability contamination challenges in interface control. Herein, this work studied a facile approach to fabricate permanent and contamination-free microstructure with high contrast wettability by means of adding a small amount of surfactant to the photoresist, rather than through any surface modification of the substrate. Accordingly, we focused on a systematic research of the wettability contamination prevention, binary wettability interfacial pattern control, and the dynamic electrowetting performance. The results demonstrated the proposed fabrication of binary wettability patterned microstructure without reactive-ion etching would be advantageous for contamination-free, permanent, simple, reliable and precise process, which could enable the microfluidic electrowetting display highly stable and controllable, thus it is expected to suit fields all the way from microfluidic-based fundamental studies to materials processing engineering and device applications.

自然界中二进制润湿性模式的多种润湿对比激发了微流控操作的多功能平台。然而，迄今为止，建立具有高度有序配置的二元可润湿性图案化的微米/纳米结构不可避免地在界面控制中带来了可润湿性污染的挑战。本文中，这项工作研究了一种通过向光刻胶中添加少量表面活性剂而不是通过对基材进行任何表面改性来制造具有高对比度可湿性的永久且无污染的微结构的简便方法。因此，我们专注于系统的研究，以防止润湿性污染，二元润湿性界面模式控制和动态电润湿性能。