A thin-film deposition system was developed for the surface coating of X-ray mirrors of up to 1 m in length. With two coating process areas and four sputtering cathodes, various combinations employing a single layer, multilayered, and co-sputtered thin films are possible. Furthermore, it is possible to correct and modify the mirror surface shape by controlling the speed of the substrate stage. In this study, to evaluate the performance of the proposed coating system, the static coating distribution was measured to check the vertical direction. In a 10 mm area, a 0.9% peak-to-valley error and 0.2% root mean square error occurred. A differential deposition test was also performed for the horizontal direction (stage scan direction). In this study, arbitrary shapes were deposited on 100-mm and 400-mm-long mirrors. After removing the measurement error, the deposition error was less than 1 nm (peak-to-valley). The results demonstrate that this system can correct the surface of an X-ray mirror with ultra-high precision.

开发了一种薄膜沉积系统，用于X射线反射镜的表面涂层，最大长度为1 m。在两个涂覆工艺区域和四个溅射阴极的情况下，采用单层，多层和共溅射薄膜的各种组合都是可能的。此外，可以通过控制基板台的速度来校正和改变镜面形状。在这项研究中，为了评估所提出的涂层系统的性能，测量了静态涂层的分布以检查垂直方向。在10 mm的区域中，发生了0.9％的峰谷误差和0.2％的均方根误差。还针对水平方向（平台扫描方向）执行了差分沉积测试。在这项研究中，任意形状都沉积在100毫米和400毫米长的镜子上。消除测量误差后，沉积误差小于1 nm（峰谷）。结果表明，该系统可以超高精度校正X射线镜的表面。