Zinc oxide (ZnO) nanostructure s were deposited by RF magnetron sputtering onto silicon wafer substrates. This study analyses the effects of varying annealing temperatures (RT, 350, 550, and 850 ͦ C) on physical properties of ZnO nanostructure. The crystalline structure, topography, electrical, optical and gas sensing properties of ZnO nanostructure were determined using X-ray diffraction (XRD), atomic force microscopy (AFM), UV–Visible Spectrometry and gas sensing system, respectively. X-ray diffraction (XRD) was used to characterise the structural and to determine the crystallite size of the ZnO nanostructure. XRD showed that the annealed ZnO nanostructure were polycrystalline in nature of hexagonal wurtzite structure. The crystallite size of the nanostructure was found to increase with thermal annealing from 38.76 nm to 68.21 nm for temperatures RT, 350 °C, 550 °C, and 850 °C respectively. AFM analyses showed a rise in roughness and grain size with increasing temperature. The variations in the optical properties before and after the temperatures were measured in the wavelength range of (200–1000) nm by using a spectrophotometer. Optical band gap was found to be increased from 3.13 to 3.42 eV with annealing. Electrical conductivity increased with the annealing. Also, in this study, CO₂ gas sensing properties of ZnO nanostructure s were investigated at different temperatures. It was found that the sensor response, response time and recovery time of ZnO nanostructure improved with increased annealing temperature.

通过RF磁控溅射将氧化锌（ZnO）纳米结构沉积到硅晶片基板上。这项研究分析了不同退火温度（RT，350、550和850℃）对ZnO纳米结构物理性能的影响。分别使用X射线衍射（XRD），原子力显微镜（AFM），紫外可见光谱和气体传感系统确定ZnO纳米结构的晶体结构，形貌，电学，光学和气体传感特性。X射线衍射（XRD）用于表征结构并确定ZnO纳米结构的微晶尺寸。XRD分析表明，退火后的ZnO纳米结构为六方纤锌矿结构。发现纳米结构的微晶尺寸随着热退火从38.76 nm增加到68。RT分别为21 nm，350°C，550°C和850°C。原子力显微镜分析表明，粗糙度和晶粒尺寸随温度升高而增加。使用分光光度计在（200–1000）nm的波长范围内测量了温度之前和之后光学特性的变化。发现随着退火，光学带隙从3.13eV增加到3.42eV。电导率随着退火而增加。另外，在这项研究中 电导率随着退火而增加。另外，在这项研究中 电导率随着退火而增加。另外，在这项研究中研究了不同温度下ZnO纳米结构的_2种气敏特性。发现随着退火温度的升高，ZnO纳米结构的传感器响应，响应时间和恢复时间得到改善。