This paper reports on the application of Rutherford Backscattering Spectrometry (RBS) and Elastic Recoil Detection Analysis (ERDA) using the microbeam system at Tohoku University. The first microbeam RBS/ERDA spectra in this beam line were successfully obtained for microstructured semiconductor devices. The results indicate a clear difference in stoichiometry and thickness after annealing. In addition, a comparison with Time-of-Flight Secondary Ion Mass Spectrometry (ToF-SIMS) analysis is presented.

中文翻译：

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μRBS/ ERDA系统在微结构器件中的应用

本文报道了东北大学使用微束系统进行的卢瑟福背散射光谱法（RBS）和弹性反冲检测分析（ERDA）的应用。该光束线中的第一个微束RBS / ERDA光谱已成功获得，用于微结构化半导体器件。结果表明退火后化学计量和厚度的明显差异。此外，还介绍了与飞行时间二次离子质谱分析（ToF-SIMS）分析的比较。