Hybrid thin films containing N,N′-bis(2-phosphonoethyl)-1,4,5,8-naphthalenediimide (PNDI) and zinc cations (PNDI/Zn films) were built on silicon and indium tin oxide (ITO) substrates by a simple layer-by-layer deposition process. Silicon substrates primed with a layer of phosphonate groups were immersed alternately into zinc nitrate and PNDI aqueous solutions, yielding PNDI/Zn films containing up to 40 layers. ITO substrates, on the other hand, were used without priming, and the deposition sequence began with a PNDI layer. All film growth steps were conducted at room temperature, using aqueous solutions, thus assuring an environmentally clean process. The PNDI/Zn films were studied by X-ray reflectivity and grazing angle X-ray diffraction, using synchrotron radiation source. The films were constituted by crystallites, containing zinc phosphonate layers oriented nearly parallel to the substrate. PNDI/Zn films on ITO were reduced to stable free radicals, which were observed by UV–visible spectroscopy. Moreover, PNDI/Zn bulk materials with structural analogy with the films were produced.

中文翻译：

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通过简单沉积技术从水溶液中生长的层状萘二酰亚胺/膦酸锌杂化薄膜

含N，N的混合薄膜通过简单的逐层构建将'-双（2-膦酰基乙基）-1,4,5,8-萘二亚胺（PNDI）和锌阳离子（PNDI / Zn膜）构建在硅和铟锡氧化物（ITO）衬底上沉积过程。将涂有膦酸酯基团的硅基材交替浸入硝酸锌和PNDI水溶液中，制得的PNDI / Zn薄膜最多包含40层。另一方面，使用ITO基板时无需打底，沉积顺序从PNDI层开始。所有薄膜生长步骤均在室温下使用水溶液进行，从而确保了环境清洁的过程。使用同步辐射源，通过X射线反射率和掠角X射线衍射研究了PNDI / Zn膜。影片是由微晶构成的，含有几乎平行于基材取向的膦酸锌层。ITO上的PNDI / Zn膜被还原成稳定的自由基，这可以通过紫外可见光谱法观察到。此外，生产了具有与膜结构相似的PNDI / Zn块状材料。