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Nanoscratch-Directed Self-Assembly of Block Copolymer Thin Films
ACS Applied Materials & Interfaces ( IF 9.5 ) Pub Date : 2021-01-20 , DOI: 10.1021/acsami.0c19665
Dong Hyup Kim 1 , Ahram Suh 2 , Geonhyeong Park 2 , Dong Ki Yoon 2, 3 , So Youn Kim 1
Affiliation  

Directed self-assembly (DSA) of block copolymer (BCP) thin films is of particular interest in nanoscience and nanotechnology due to its superior ability to form various well-aligned nanopatterns. Herein, nanoscratch-DSA is introduced as a simple and scalable DSA strategy allowing highly aligned BCP nanopatterns over a large area. A gentle scratching on the target substrate with a commercial diamond lapping film can form uniaxially aligned nanoscratches. As applied in BCP thin films, the nanoscratch effectively guides the self-assembly of overlying BCPs and provides highly aligned nanopatterns along the direction of the nanoscratch. The nanoscratch-DSA is not material-specific, allowing more versatile nanofabrication for various functional nanomaterials. In addition, we demonstrate that the nanoscratch-DSA can be utilized as a direction-controllable and area-selective nanofabrication method.

中文翻译:

纳米划痕定向嵌段共聚物薄膜的自组装

嵌段共聚物(BCP)薄膜的定向自组装(DSA)在纳米科学和纳米技术中特别受关注,因为它具有形成各种良好排列的纳米图案的出色能力。在本文中,引入了nanoscratch-DSA作为一种简单且可扩展的DSA策略,该策略允许在大面积上高度对齐的BCP纳米图案。用商用金刚石研磨膜在目标基材上轻轻刮擦会形成单轴排列的纳米刮擦。如应用于BCP薄膜中,纳米划痕可有效引导上覆BCP的自组装,并沿纳米划痕的方向提供高度对齐的纳米图案。nanoscratch-DSA不是特定于材料的,因此可以用于各种功能纳米材料的多功能纳米加工。此外,
更新日期:2021-02-03
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