Indium tin oxide (ITO) thin films are widely used as transparent electrodes in electronic devices. Many of those electronic devices are heat sensitive, thus their manufacturing process steps should not exceed 100 °C. Manufacturing competitive high-quality ITO films at low temperature at industrial scale is still a challenge. Magnetron sputtering technology is the most suitable technology fulfilling those requirements. However, ITO layer properties and the reproducibility of the process are extremely sensitive to process parameters. Here, morphological, structural, electrical, and optical characterization of the ITO layers deposited at low temperature has been successfully correlated to magnetron sputtering process parameters. It has been demonstrated that the oxygen flow controls and influences layer properties. For oxygen flow between 3–4 sccm, high quality crystalline layers were obtained with excellent optoelectronic properties (resistivity <8 × 10⁻⁴ Ω·cm and visible transmittance >80%). The optimized conditions were applied to successfully manufacture transparent ITO heaters on large area glass and polymeric components. When a low supply voltage (8 V) was applied to transparent heaters (THs), de-icing of the surface was produced in less than 2 min, showing uniform thermal distribution. In addition, both THs (glass and polycarbonate) showed a great stability when exposed to saline solution.

中文翻译：

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室温下磁控溅射铟锡氧化物薄膜沉积技术用于高效透明加热器的制造

氧化铟锡（ITO）薄膜被广泛用作电子设备中的透明电极。这些电子设备中有许多对热敏感，因此其制造工艺步骤不应超过100°C。在低温下以工业规模制造具有竞争力的高质量ITO膜仍然是一个挑战。磁控溅射技术是满足这些要求的最合适技术。但是，ITO层的性质和工艺的可重复性对工艺参数极为敏感。在这里，在低温下沉积的ITO层的形态，结构，电学和光学特性已成功地与磁控溅射工艺参数相关联。已经证明氧气流量控制并影响层的性能。对于3-4 sccm之间的氧气流量，^-4 Ω·cm且可见光透射率> 80％）。应用优化的条件成功地在大面积玻璃和聚合物组件上制造了透明ITO加热器。在透明加热器（THs）上施加低电源电压（8 V）时，不到2分钟即可产生表面除冰，显示出均匀的热分布。此外，THs（玻璃和聚碳酸酯）在暴露于盐溶液时均显示出很高的稳定性。