Main-chain-scission-type resists have been widely used for the fabrication of nanodevices. A copolymer consisting of methyl α-chloroacrylate and α-methylstyrene, known as the ZEP series of ZEON, is a popular main-chain-scission-type positive-tone resist. In this study, the dissolution kinetics were investigated using the ZEP series to clarify the effects of the molecular weight distribution and developer on the dissolution kinetics of the main-chain-scission-type resist. The thickness of the transiently swelling layer in hexyl acetate development was less than that in pentyl acetate development. The thickness of the transiently swelling layer depended on the molecular weight distribution of resist polymers.

主链断裂型抗蚀剂已被广泛用于制造纳米器件。由α-氯丙烯酸甲酯和α-甲基苯乙烯组成的共聚物，被称为ZEON的ZEP系列，是一种流行的主链断裂型正性抗蚀剂。在这项研究中，使用ZEP系列研究了溶解动力学，以阐明分子量分布和显影剂对主链断裂型抗蚀剂溶解动力学的影响。乙酸己酯显影中的瞬时溶胀层的厚度小于乙酸戊酯显影中的瞬时溶胀层的厚度。瞬时溶胀层的厚度取决于抗蚀剂聚合物的分子量分布。