In this study, a dual-power (RF-superimposed DC) with four-target magnetron sputtering system was used to deposit transparent, conducting indium-tin-oxide (ITO) films on polycarbonate (PC) substrates at low-temperatures process (25–120 °C). A sheet resistance of 350–500 Ω/sq, resistivity of ~10⁻⁴ Ω-cm, and light transmittance of 88% in the visible range were achieved. In addition, the simulation and experimental results showed that the deposited 20-nm-thick ITO film with two- and four-layer anti-reflective film (SiO₂/TiO₂ and SiO₂/TiO₂/SiO₂/TiO₂) structures could improve the light penetration characteristics. The transmittance of the multilayer stack (ITO/anti-reflective films/PC) can reach 91% which is ~3% higher than that of the bare ITO-on-PC sample. The experimental results also showed that the low turbidity (haze < 0.08%), excellent adhesion (ASTM class is 5B), and hardness (2H–4H) of ITO/anti-reflection films/PC structure could be suitable for capacitive touch panel applications.

在这项研究中，采用四靶磁控溅射系统的双电源（RF叠加DC）在低温工艺下在聚碳酸酯（PC）基板上沉积透明的导电铟锡氧化物（ITO）膜（25 –120°C）。350-500Ω/□，的〜10的电阻率的薄层电阻^-4 分别实现Ω-cm，并且在可见光范围内的88％的透光率。另外，仿真和实验结果表明，所沉积的20 nm厚的ITO膜具有两层和四层抗反射膜（SiO ₂ / TiO ₂和SiO ₂ / TiO ₂ / SiO ₂ / TiO ₂）结构可以改善光穿透特性。多层堆叠（ITO /减反射膜/ PC）的透射率可以达到91％，比PC上裸ITO的透射率高约3％。实验结果还表明，ITO /减反射膜/ PC结构的低浊度（雾度<0.08％），优异的附着力（ASTM等级为5B）和硬度（2H–4H）可适用于电容式触摸屏应用。