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Skyrmion Phase in MnSi Thin Films Grown on Sapphire by a Conventional Sputtering
Nanoscale Research Letters ( IF 5.418 ) Pub Date : 2021-01-06 , DOI: 10.1186/s11671-020-03462-2
Won-Young Choi , Hyun-Woo Bang , Seung-Hyun Chun , Sunghun Lee , Myung-Hwa Jung

Topologically protected chiral skyrmions are an intriguing spin texture that has attracted much attention because of fundamental research and future spintronic applications. MnSi with a non-centrosymmetric structure is a well-known material hosting a skyrmion phase. To date, the preparation of MnSi crystals has been investigated by using special instruments with an ultrahigh vacuum chamber. Here, we introduce a facile way to grow MnSi films on a sapphire substrate using a relatively low vacuum environment of conventional magnetron sputtering. Although the as-grown MnSi films have a polycrystalline nature, a stable skyrmion phase in a broad range of temperatures and magnetic fields is observed via magnetotransport properties including phenomenological scaling analysis of the Hall resistivity contribution. Our findings provide not only a general way to prepare the materials possessing skyrmion phases but also insight into further research to stimulate more degrees of freedom in our inquisitiveness.



中文翻译:

通过常规溅射在蓝宝石上生长的MnSi薄膜中的Skyrmion相

受拓扑保护的手性天​​空蛋白是一种吸引人的自旋纹理,由于基础研究和未来的自旋电子学应用而备受关注。具有非中心对称结构的MnSi是承载天生离子相的众所周知的材料。迄今为止,已经通过使用具有超高真空室的特殊仪器研究了MnSi晶体的制备。在这里,我们介绍了一种使用常规磁控溅射的较低真空环境在蓝宝石衬底上生长MnSi膜的简便方法。尽管生长的MnSi薄膜具有多晶性质,但通过包括霍尔电阻率贡献的现象学标度分析在内的磁传输特性,可以观察到在较宽的温度和磁场范围内稳定的天生离子相。

更新日期:2021-01-07
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