Helium ion beam (HIB) technology plays an important role in the extreme fields of nanofabrication. This paper reviews the latest developments in HIB technology as well as its extreme processing capabilities and widespread applications in nanofabrication. HIB-based nanofabrication includes direct-write milling, ion beam- induced deposition, and direct-write lithography without resist assistance. HIB nanoscale applications have also been evaluated in the areas of integrated circuits, materials sciences, nano-optics, and biological sciences. This review covers four thematic applications of HIB: (1) helium ion microscopy imaging for biological samples and semiconductors; (2) HIB milling and swelling for 2D/3D nanopore fabrication; (3) HIB-induced deposition for nanopillars, nanowires, and 3D nanostructures; (4) additional HIB direct writing for resist, graphene, and plasmonic nanostructures. This paper concludes with a summary of potential future applications and areas of improvement for HIB extreme nanofabrication technology.

氦离子束（HIB）技术在纳米制造的极端领域中发挥着重要作用。本文回顾了HIB技术的最新发展及其极强的处理能力以及在纳米加工中的广泛应用。基于HIB的纳米加工包括直接光刻，离子束诱导沉积和无需光刻胶辅助的直接光刻。HIB纳米级应用也已在集成电路，材料科学，纳米光学和生物科学领域得到评估。这篇综述涵盖了HIB的四个主题应用：（1）用于生物样品和半导体的氦离子显微镜成像；（2）用于2D / 3D纳米孔制造的HIB铣削和溶胀；（3）HIB诱导的纳米柱，纳米线和3D纳米结构沉积；（4）用于抗蚀剂的其他HIB直接写入，石墨烯和等离子体纳米结构。本文总结了HIB极限纳米制造技术的潜在未来应用和改进领域。