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Speckle Interferometric Investigation of Argon Pressure-Induced Surface Roughness Modifications in RF-Sputtered MoO3 Film
Journal of Nondestructive Evaluation ( IF 2.8 ) Pub Date : 2021-01-03 , DOI: 10.1007/s10921-020-00741-x
S. Soumya , R. Arun Kumar , S. Sreejyothi , Vimal Raj , M. S. Swapna , S. Sankararaman

Film quality analysis is of more considerable significance due to its diversified applications in various fields of technology. The present work reports the speckle interferometric analysis of the argon pressure-induced surface roughness modifications of RF sputtered MoO 3 films. The paper suggests a new method of surface quality analysis of thin films through a parameter δ, which is the difference between the initial and final inertia moment values in the study of the thermal-induced dynamic speckle pattern. The limitations of root mean square surface roughness analysis of the atomic force microscopic image of the films is also exemplified. The research suggests that argon pressure plays a vital role in the surface property of RF sputtered films and also that the dynamic speckle analysis can give precise information about the quality of films. The contour plot of particle displacement vector under thermal stress, suggests the degree of uniformity in the distribution of particles in the film.

中文翻译:

氩气压力引起的 RF 溅射 MoO3 薄膜表面粗糙度变化的散斑干涉研究

薄膜质量分析因其在各个技术领域的多样化应用而具有更为重要的意义。目前的工作报告了 RF 溅射的 MoO 3 薄膜的氩压力引起的表面粗糙度修改的散斑干涉测量分析。该论文提出了一种通过参数 δ 进行薄膜表面质量分析的新方法,该参数是热致动态散斑图案研究中初始惯性矩值和最终惯性矩值之间的差值。还举例说明了薄膜原子力显微图像的均方根表面粗糙度分析的局限性。研究表明,氩气压力在射频溅射薄膜的表面特性中起着至关重要的作用,而且动态散斑分析可以提供有关薄膜质量的精确信息。
更新日期:2021-01-03
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