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Erbium energy levels in GaN grown by hydride vapor phase epitaxy
Aip Advances ( IF 1.6 ) Pub Date : 2020-12-01 , DOI: 10.1063/5.0028470
Y. Q. Yan 1 , T. B. Smith 1 , J. Li 1 , J. Y. Lin 1 , H. X. Jiang 1
Affiliation  

Erbium doped GaN (Er:GaN) is a promising candidate as a novel gain medium for solid-state high energy lasers (HELs) due to its superior physical properties over a synthetic garnet such as Nd:YAG. Er:GaN emits in the 1.5 µm region, which is retina-safe and has a high transmission in the air. We report photoluminescence (PL) studies performed on Er:GaN epilayers synthesized by the hydride vapor phase epitaxy (HVPE) technique. The room temperature PL spectra of HVPE grown Er:GaN epilayers resolved as many as 11 and seven emission lines in the 1.5 µm and 1.0 µm wavelength regions, respectively, corresponding to the intra-4f shell transitions between Stark levels from the first (4I13/2) and the second (4I11/2) excited states to the ground state (4I15/2) of Er3+ in GaN. The observed peak positions of these transitions enabled the construction of the detailed energy levels in Er:GaN. The results agree well with those of the calculation based on a crystal field analysis. Precise determination of the detailed energy levels of the Stark levels in the 4I11/2, 4I13/2, and 4I15/5 states is critically important for the realization of HELs based on Er:GaN.

中文翻译:

氢化物气相外延生长的GaN中的energy能级

掺b GaN(Er:GaN)由于其优于诸如Nd:YAG之类的石榴石的优异物理性能,因此有望成为固态高能激光器(HEL)的新型增益介质。二:在1.5的GaN发射μ米区域,这是视网膜安全,并具有在空气中具有高透射。我们报告了通过氢化物气相外延(HVPE)技术合成的Er:GaN外延层上进行的光致发光(PL)研究。生长尔HVPE的室温PL光谱:氮化镓外延层解决多达11和在1.5 7发射线μ m和1.0 μ米的波长区域,分别从所述第一对应于斯塔克电平之间的内4F壳过渡(4 I 13/2)和第二个(4 I 11/2)激发态到GaN中Er 3+的基态(4 I 15/2)。观察到的这些跃迁的峰值位置可以构建Er:GaN中的详细能级。结果与基于晶体场分析的计算结果非常吻合。精确确定4 I 11 / 2,4 I 13/24 I 15/5状态下Stark能级的详细能级对于实现基于Er:GaN的HEL至关重要。
更新日期:2020-12-31
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