The Deal–Grove model is a state‐of‐the‐art approach proposed for describing the thermal oxidation of silicon and the oxide thickness over time. In this study, the Deal–Grove concept provided the inspiration for a mathematical model for simulating plasma jet‐based dry etching process of borosilicate crown glass (N‐BK7®). The whole process is contained in two so‐called Deal–Grove parameters, which are extracted from experimental data including local etching depth and surface temperature distribution. The proposed model is extended for the evolution of dynamic etch profiles, and the obtained results are validated experimentally. By establishing such a model, it is possible to predict the effect of the residual layer and surface temperature on the evolution of local etching depths over dwell time.

中文翻译：

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一种新颖的基于Deal-Grove的硼硅冠光学玻璃基于氟的等离子射流刻蚀模型

Deal-Grove模型是用于描述硅的热氧化和随时间变化的氧化物厚度的最新方法。在本研究中，Deal-Grove概念为数学模型提供了灵感，该数学模型用于模拟基于等离子流的硼硅冠玻璃（N-BK7®）的干法蚀刻工艺。整个过程包含在两个所谓的Deal-Grove参数中，这些参数是从包括局部蚀刻深度和表面温度分布在内的实验数据中提取的。所提出的模型被扩展用于动态刻蚀轮廓的演变，并且获得的结果在实验上得到了验证。通过建立这样的模型，可以预测残留层和表面温度对停留时间上局部蚀刻深度的演变的影响。