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Determination of the light exposure on the photodiodes of a new instrumented baffle for the Virgo input mode cleaner end-mirror
Classical and Quantum Gravity ( IF 3.5 ) Pub Date : 2020-12-25 , DOI: 10.1088/1361-6382/abce6b
A Romero-Rodrguez 1 , A Allocca 2 , A Chiummo 3 , M Martnez 1, 4 , Ll M Mir 1 , H Yamamoto 5
Affiliation  

As part of the upgrade program of the Advanced Virgo interferometer, the installation of new instrumented baffles surrounding the main test masses is foreseen. As a demonstrator, and to validate the technology, the existing baffle in the area of the input mode cleaner end-mirror will be first replaced by a baffle equipped with photodiodes. This paper presents detailed simulations of the light distribution on the input mode cleaner baffle, with the aim to determine the light exposure of the photodiodes under different scenarios of the interferometer operation.

中文翻译:

确定 Virgo 输入模式清洁器端镜的新型仪表挡板的光电二极管上的曝光量

作为先进处女座干涉仪升级计划的一部分,预计将在主要测试质量周围安装新的仪表挡板。作为演示者,为了验证该技术,输入模式清洁器端镜区域中的现有挡板将首先替换为配备光电二极管的挡板。本文介绍了输入模式清洁器挡板上光分布的详细模拟,目的是确定干涉仪操作的不同场景下光电二极管的曝光量。
更新日期:2020-12-25
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