This work presents the result of modeling a miniature forming lens for a high-voltage electron-beam lithography system. The diameter of the outer yoke is only 64 mm. This allows the installation of four electron optical systems over a six-inch photomask. For a 50-kV electron beam and 15 mm flange focal distance, the characteristics of the obtained miniature lens provide the absence of yoke saturation and a 25-nm resolution for a 100 × 100 um scanning field. A study of the dependences of the miniature lens’ electron-optical properties on the channel diameter, gap width and yoke length is performed. The obtained results enable selection of the optimal configuration of the forming lens for the development of an electron-beam-lithography system. A four-column composition will allow an increase in the efficiency of the lithography process by up to four times.

这项工作提出了对高压电子束光刻系统的微型成形透镜进行建模的结果。外轭的直径仅为64 mm。这允许在一个六英寸的光罩上安装四个电子光学系统。对于50 kV电子束和15 mm法兰焦距，所获得的微型透镜的特性提供了没有磁轭饱和的特性，并且对于100×100 um的扫描场分辨率为25 nm。研究了微型透镜的电子光学特性对通道直径，间隙宽度和轭长度的依赖性。获得的结果使得能够为电子束光刻系统的发展选择成形透镜的最佳配置。