Abstract Co-Ni-Al is considered as a suitable ferromagnetic shape-memory alloy and has significant control over structural transformation temperature, magnetic parameters, and ductility. In this paper, the fabrication of Co-Ni-Al alloy thin films on Si (1 0 0) substrate was achieved via pulsed laser deposition (PLD) technique. The developed films annealing was done at 573, 673, and 773K temperatures and inveterate their crystalline structure, phase analysis, and magnetic nature of the annealed Co38Ni35Al27 films. X-ray diffraction analysis at 773 K annealing temperature reveals that, the Co38Ni35Al27 film shows high crystallinity, and all annealed films have a body-centered cubic phase structure. The particle size estimated from Scherrer rule is noticed to increase from 10 to 22 nm when the annealing temperature raised to 773K. From the SEM images, we infer that there is an increase in grain size when the annealing temperature increases and the grains shape looks spherical. The magnetic study of the samples shows that the film possesses highest magnetic saturation and lowest coercivity at 773 K annealing temperature. Also, the film annealed at 773 K exhibits a wide range of transformation temperatures and has a curie temperature of 180 K.

中文翻译：

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后退火对脉冲激光沉积生长的 Co-Ni-Al 铁磁形状记忆合金薄膜结构和磁性能的影响

摘要 Co-Ni-Al 被认为是一种合适的铁磁形状记忆合金，对结构转变温度、磁性参数和延展性有显着控制。在本文中，通过脉冲激光沉积（PLD）技术在Si（1 0 0）衬底上制备了Co-Ni-Al合金薄膜。所开发的薄膜在 573、673 和 773K 温度下进行退火，并不断改进其晶体结构、相分析和退火 Co38Ni35Al27 薄膜的磁性。773 K退火温度下的X射线衍射分析表明，Co38Ni35Al27薄膜结晶度高，所有退火薄膜均具有体心立方相结构。当退火温度升高到 773K 时，注意到根据 Scherrer 规则估计的粒径从 10 nm 增加到 22 nm。从 SEM 图像来看，我们推断当退火温度升高时晶粒尺寸增加并且晶粒形状看起来是球形的。样品的磁性研究表明，该薄膜在 773 K 退火温度下具有最高的磁饱和度和最低的矫顽力。此外，在 773 K 下退火的薄膜表现出广泛的转变温度范围，居里温度为 180 K。