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The Effect of Plasma Density on the Degree of Suppression of Analyte Signals in ICP-MS
Technical Physics ( IF 0.7 ) Pub Date : 2020-12-11 , DOI: 10.1134/s1063784220120166
T. K. Nurubeyli

Abstract

Possible effects of ionization phenomena on the analytical signal in inductively coupled plasma mass spectrometry with a high-temperature ion source are considered. The dependences of the degree of suppression of ion signals on the electron density are calculated and experimentally determined for ions of matrix and impurity elements. It is shown that the degree of signal suppression depends rather strongly on the electron density in the analytical zone in the presence of matrix elements with different first ionization potentials. The effects of the inductive plasma power and sputtering argon rate on the sensitivity of the mass spectrometer are studied by the example of an ICP-MS mass spectrometer (Agilent Technologies). The experimental results showed that the origin of the suppression of the analyte signals at the output is apparently associated with the ion–electron recombination of ions (both matrix and impurity ones) in the plasma region.



中文翻译:

等离子体密度对ICP-MS中分析物信号抑制程度的影响

摘要

在使用高温离子源的电感耦合等离子体质谱法中,考虑了电离现象对分析信号的可能影响。对于基质和杂质元素的离子,计算并实验确定了离子信号抑制程度对电子密度的依赖性。结果表明,在存在具有不同第一电离电势的基质元素的情况下,信号抑制的程度在很大程度上取决于分析区内的电子密度。以ICP-MS质谱仪(安捷伦科技公司)为例,研究了感应等离子体功率和溅射氩气速率对质谱仪灵敏度的影响。

更新日期:2020-12-12
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