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Effects of annealing on phase structure and magnetic characteristics of sputter deposited Ni2FeGa/Si (100) thin films
Functional Materials Letters ( IF 1.3 ) Pub Date : 2020-10-28 , DOI: 10.1142/s1793604720510480
S. Vinodh Kumar 1 , Zhigang Wu 1 , Zuoyu Sun 1 , M. Manivel Raja 2 , M. Mahendran 3
Affiliation  

This paper investigates the effects of post-deposition annealing on the evolution of phase structure and magnetic properties of magnetron sputtered Ni2FeGa/Si (001) thin films. The results revealed that the as-deposited film was partially crystallized in an fcc structure, i.e. [Formula: see text] phase. Crystallization of the amorphous structure into the [Formula: see text] phase was greatly encouraged following annealing at 723 K for 1 h. Annealing at higher temperatures for the same period triggered the formation of the bcc austenitic phase, which competed with the [Formula: see text] phase simultaneously for crystallization and grain growth. The evolution of phase structure and grain size also influenced the nanomechanical properties of the films according to the nanoindentation measurement. The film annealed at 873 K for 1 h showed high hardness and elastic modulus values of 11.1 GPa and 156 GPa. The [Formula: see text] phase showed stronger ferromagnetic characteristics relative to the bcc austenite due to the richer Fe content. This leads to the saturation magnetization to be maximized at 80 emu/g when annealed at 773 K for 1 h attributed to the enhanced film crystallinity and dominant volume fraction of [Formula: see text] phase in the thin film.

中文翻译:

退火对溅射沉积Ni2FeGa/Si(100)薄膜相结构和磁特性的影响

本文研究了沉积后退火对磁控溅射镍相结构演变和磁性能的影响。2FeGa/Si (001) 薄膜。结果表明,沉积膜部分结晶为fcc结构,即[公式:见正文]相。在 723 K 退火 1 小时后,极大地促进了非晶结构结晶成 [公式:见正文] 相。同一时期在较高温度下退火引发了 bcc 奥氏体相的形成,它与 [公式:见正文] 相同时竞争结晶和晶粒生长。根据纳米压痕测量,相结构和晶粒尺寸的演变也影响了薄膜的纳米力学性能。在 873 K 下退火 1 小时的薄膜显示出高硬度和弹性模量值,分别为 11.1 GPa 和 156 GPa。公式:见正文]相由于更丰富的Fe含量而显示出相对于bcc奥氏体更强的铁磁特性。这导致在 773 K 退火 1 小时时饱和磁化强度最大为 80 emu/g,这归因于薄膜结晶度的提高和薄膜中 [公式:见正文] 相的主要体积分数。
更新日期:2020-10-28
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