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The Use of Silicon Dioxide Films as Anti-Reflective Coating of Thermoelectric Single-Photon Detector
Journal of Contemporary Physics (Armenian Academy of Sciences) ( IF 0.6 ) Pub Date : 2020-12-03 , DOI: 10.3103/s1068337220040106
A. A. Kuzanyan , S. I. Petrosyan , A. S. Kuzanyan , G. R. Badalyan

Abstract

Antireflection layers are an important part of the sensitive elements of high performance single photon detectors. We have obtained amorphous silicon dioxide films by electron-beam sputtering on Al2O3, AlN, Si substrates as well as CeB6, LaB6, and W coatings. The elemental composition, microstructure and surface roughness, as well as optical characteristics of the samples obtained under various conditions of spraying are investigated. It is shown that SiO2/Al2O3 and SiO2/AlN two-layer coatings can provide high detection efficiency under registration of the radiation in the near IR region, which is used in telecommunication systems and devices for quantum information processing.



中文翻译:

二氧化硅膜用作热电单光子探测器的抗反射涂层

摘要

抗反射层是高性能单光子探测器敏感元件的重要组成部分。我们已经通过电子束溅射在Al 2 O 3,AlN,Si衬底以及CeB 6,LaB 6和W涂层上获得了非晶态二氧化硅薄膜。研究了在各种喷涂条件下获得的样品的元素组成,微观结构和表面粗糙度以及光学特性。结果表明,SiO 2 / Al 2 O 3和SiO 2/ AlN两层涂层可以在近红外区域的辐射配准下提供高检测效率,该涂层用于电信系统和量子信息处理设备。

更新日期:2020-12-03
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