Atomic layer deposition (ALD) has been extensively used in the modification of semiconductor surfaces for scientific and industrial applications. It employs labile organometallic precursors that add to the surface layers of solids in a vacuum that are subsequently activated by surface hydrolysis. In recent applications, it has been used in the preparation of electrodes for molecularly based dye-sensitized solar cells (DSSCs) and dye-sensitized photoelectrosynthesis cells (DSPECs) for solar energy conversion. This review focuses on applications of ALD in DSPECs for the preparation of solar fuels based on modified semiconductor surfaces. In this area, ALD has been used to prepare core/shell structures that modify surface-interfacial electron transfer, to prepare structures that stabilize surface-bound chromophores and catalysts, and for the preparation of overlayer structures that stabilize electrodes for water oxidation and photocathodes for H₂ or CO₂ reduction.

原子层沉积（ALD）已广泛用于科学和工业应用的半导体表面改性中。它使用不稳定的有机金属前体，该前体在真空中添加到固体表面层中，随后通过表面水解活化。在最近的应用中，其已被用于制备用于基于分子的染料敏化太阳能电池（DSSC）和用于太阳能转换的染料敏化光电子合成电池（DSPEC）的电极。这篇综述着重于ALD在DSPEC中用于基于改性半导体表面制备太阳能的应用。在此领域，ALD已用于制备可改变表面界面电子转移的核/壳结构，可稳定表面结合的生色团和催化剂的结构，₂或CO ₂还原。