The influence of energetic ion bombardment on the properties of tantalum coatings was studied. To achieve such energetic ion bombardment during the deposition process of tantalum coatings, a combination of deep oscillation magnetron sputtering (DOMS), an ionized physical vapour deposition technique, with substrate biasing was used. The substrate biasing was varied between 0 and −120 V. In this work, the structure (XRD), microstructure (SEM), surface morphology (AFM) and hardness, and Young’s modulus (nanoindentation) of the coatings were characterized. The results show with the use of such conditions it was possible to deposit a pure α-Ta (the most desired at industrial level) with improved mechanical properties (hardness equal to 22.4 GPa and Young’s modulus equal to 235 GPa). The roughness of the Ta coatings decreases up to values of about 1 nm with an increase of substrate biasing. It was possible to deposit very dense Ta coatings with 2 µm of thickness. Therefore, these results are significantly different than in previous works, offering Ta coatings with a combination of very interesting properties.

中文翻译：

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在深振荡磁控溅射模式下，衬底偏压对使用HiPIMS沉积钽涂层的结构和性能的影响

研究了高能离子轰击对钽涂层性能的影响。为了在钽涂层的沉积过程中实现这种高能离子轰击，结合使用了深度振荡磁控溅射（DOMS），电离物理气相沉积技术和衬底偏压。基材偏压在0至-120 V之间变化。在这项工作中，表征了涂层的结构（XRD），微观结构（SEM），表面形态（AFM）和硬度以及杨氏模量（纳米压痕）。结果表明，在这种条件下，可以沉积纯的α-Ta（工业上最需要的），具有改善的机械性能（硬度等于22.4 GPa，杨氏模量等于235 GPa）。随着基材偏压的增加，Ta涂层的粗糙度降低到大约1 nm。可以沉积厚度为2 µm的非常致密的Ta涂层。因此，这些结果与以前的工作显着不同，为Ta涂层提供了非常有趣的性能组合。