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Transition‐Metal‐Free C−H Silylation: An Emerging Strategy
Asian Journal of Organic Chemistry ( IF 2.7 ) Pub Date : 2020-11-30 , DOI: 10.1002/ajoc.202000584
Arpana Tyagi 1 , Naveen Yadav 1 , Jabir Khan 1 , Sanjay Singh 1 , Chinmoy Kumar Hazra 1
Affiliation  

Silicon‐containing molecules are of great interest with widespread applications in several research areas such as polymer chemistry, materials science, medicinal chemistry, and complex molecule synthesis. Transition‐metal‐free C−H silylation is an essential process because this process is useful in fabricating carbon‐silicon bonds which can be further transformed into a number of other compounds. Since transition‐metal‐catalyzed C−H bond silylation is a developed field, therefore this context only contains transition‐metal‐free pathways for transforming C−H bond to C−Si (Si=SiR3) bond. This review has been further categorized and subcategorized based on intermediates involved and catalysts used during this transformation. This synopsis summarizes recent developments in the area of silicon chemistry with a focus of innovative transition‐metal‐free catalytic silylation using different strategies such as free radical, base promoted, Brønsted acid, Lewis acid, and frustrated Lewis pair.

中文翻译:

无过渡金属CH甲硅烷基化:新兴策略

含硅分子在聚合物化学,材料科学,药物化学和复杂分子合成等多个研究领域中得到广泛应用,引起了广泛的关注。不含过渡金属的CH甲硅烷基化是必不可少的过程,因为该过程可用于制造碳-硅键,该碳-硅键可进一步转化为许多其他化合物。由于过渡金属催化的CH键的甲硅烷基化是一个发达的领域,因此,本文仅包含将CH键转换为CSi(Si = SiR3)键的无过渡金属的途径。根据所涉及的中间体和此转化过程中使用的催化剂,该综述已被进一步分类和细分。
更新日期:2020-11-30
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