An effective method based on laser etching and driving layer strategy was proposed to prepare patterned Ag nanoparticles (Ag NPs) on fluorine-doped tin oxide (FTO)/glass substrate and thus to enhance the photoelectric properties. This method successively included depositing an aluminum-doped zinc oxide (AZO) driving layer, laser etching, depositing an Ag layer, furnace annealing and laser removal. Different AZO and Ag layer thicknesses were adopted, and the surface morphology, crystal structure and photoelectric properties were investigated. An Ag NPs/FTO/glass sample without an AZO driving layer was prepared for comparison. It was found that furnace annealing of the Ag layer combined with the AZO driving layer, rather than that without the AZO driving layer, was more conducive to generating patterned Ag NPs. Using a 20-nm-thick AZO layer and a 150-nm-thick Ag layer led to the formation of uniformly distributed Ag NPs being aligned along the laser-etched grooves to form a pattern. The as-obtained sample had the best comprehensive photoelectric property with an average transmittance of 79.95%, a sheet resistance of 7.11 Ω/sq and the highest figure of merit of 1.50 × 10⁻² Ω⁻¹, confirming the feasibility of the proposed method and providing enlightenment for related researches of transparent conductive oxide-based films.

提出了一种基于激光刻蚀和驱动层策略的有效方法，可以在掺氟氧化锡（FTO）/玻璃基板上制备图案化的Ag纳米颗粒（Ag NPs），从而提高光电性能。该方法依次包括沉积铝掺杂的氧化锌（AZO）驱动层，激光蚀刻，沉积Ag层，炉子退火和激光去除。采用不同的AZO和Ag层厚度，并研究了其表面形态，晶体结构和光电性能。制备了没有AZO驱动层的Ag NPs / FTO /玻璃样品用于比较。发现与不具有AZO驱动层的Ag层结合的Ag层的炉内退火更有利于产生图案化的Ag NP。使用厚度为20 nm的AZO层和厚度为150 nm的Ag层会导致形成均匀分布的Ag NP，这些NP沿激光蚀刻的凹槽排列，从而形成图案。如此获得的样品具有最佳的综合光电性能，平均透射率为79.95％，薄层电阻为7.11Ω/ sq，最高品质因数为1.50×10^-2  Ω ^-1，证实了该方法的可行性，并为透明导电氧化物系膜的相关研究提供启示。