Simple, low cost spray pyrolysis technique is implemented herein to deposit thin film of Cu₂SnS₃ on a glass substrate for photovoltaic applications. Structural, physical, chemical and optical properties of the thin film were analyzed by XRD, SEM, AFM and UV-VIS spectroscopy. The XRD pattern indicated tetragonal phase of the deposited Cu₂SnS₃ thin film having major XRD peaks at 2θ of 28.54°, 33.07° and 47.47° corresponding to the (112), (200), and (220) planes. It was inferred from SEM and AFM micrographs that the surface was smooth without any pinholes or cracks. The root mean square value of film surface roughness was found to be 11.74 nm and film thickness was measured 200 nm. The AFM and SEM results indicated that the deposited thin film was densely packed and strongly adhered to the substrate. The energy band gap of the deposited Cu₂SnS₃ thin film was found to be 1.6eV via UV–Vis spectroscopy.

本文中实现了简单，低成本的喷雾热解技术，以将Cu ₂ SnS ₃薄膜沉积在用于光伏应用的玻璃基板上。通过XRD，SEM，AFM和UV-VIS光谱分析了薄膜的结构，物理，化学和光学性质。XRD图谱表示沉积的Cu ₂ SnS _3的四方相具有在对应于（112），（200）和（220）平面的2θ分别为28.54°，33.07°和47.47°的主要XRD峰的薄膜。由SEM和AFM显微照片推断，表面光滑，没有任何针孔或裂纹。膜表面粗糙度的均方根值为11.74nm，膜厚为200nm。原子力显微镜和扫描电镜结果表明，沉积的薄膜紧密堆积并牢固地粘附在基材上。通过UV-Vis光谱发现沉积的Cu ₂ SnS ₃薄膜的能带隙为1.6eV。