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Plasmonic nitriding of graphene on a graphite substrate via gold nanoparticles and NH3/Ar plasma
Journal of Vacuum Science & Technology A ( IF 2.9 ) Pub Date : 2020-10-05 , DOI: 10.1116/6.0000405
Takeshi Kitajima 1 , Machiko Miyake 1 , Ryo Katoh 1 , Toshiki Nakano 1
Affiliation  

In this work, the optical response of the gold nanoparticles is used for low-damage nitridation of graphene over a graphite substrate. Nitrogen-doped graphene with high two-dimensional crystallinity is successfully formed via radicals and light from a low-temperature, low-pressure, inductively coupled argon-diluted ammonia plasma. The graphene over a graphite substrate is covered with gold nanoparticles with an average diameter of 6.2 nm and irradiated with light and NHx radicals produced by the plasma. The use of an ion shield to prevent ion bombardment enabled a high quaternary N site density with significant Raman 2D signal. The intensity ratio of 2D to G reaches seven in some samples. Nitrogen doping with low damage to the graphene lattice is promoted by hot-electron injection from photoexcited gold nanoparticle plasmons into the adsorbed state of NHx radicals. With the addition of ion bombardment, a high pyridinic N density is achieved, along with the production of a graphene edge. The optical response of the gold nanoparticles provides supporting evidence for the preferential nitridation of the graphene edge. It can be inferred that hot electrons supplied by surface plasmon resonance, which is unique to the gold nanoparticles, or photoemission by ultraviolet rays promote the reaction between NHx radicals and the substrate surface.

中文翻译:

通过金纳米颗粒和NH3 / Ar等离子体在石墨基底上进行石墨烯的等离子氮化

在这项工作中,金纳米颗粒的光学响应用于石墨基板上石墨烯的低损伤氮化。通过自由基和低温,低压,感应耦合氩稀释的氨等离子体产生的光,成功地形成了具有高二维结晶度的掺氮石墨烯。石墨基板上的石墨烯被平均直径为6.2 nm的金纳米颗粒覆盖,并用光和NH x照射等离子体产生的自由基。通过使用离子防护罩防止离子轰击,可以实现具有显着拉曼2D信号的高四元N位密度。在某些样本中,二维与G的强度比达到7。通过光激发金纳米粒子等离子体激元向NH x的吸附态进行热电子注入,促进了对石墨烯晶格损害小的氮掺杂。部首。通过添加离子轰击,可以实现高吡啶基N密度以及石墨烯边缘的生产。金纳米颗粒的光学响应为石墨烯边缘的优先氮化提供了支持证据。可以推断出,由表面等离振子共振提供的热电子是金纳米颗粒独有的,或者由紫外线引起的光发射促进了NH x自由基与基底表面之间的反应。
更新日期:2020-11-25
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