The synthesis of the hydrophobic silica layer was conducted using the sol–gel method by reacting silica precursor trimethylchlorosilane (TMCS) and tetraethylorthosilicate (TEOS) with variations in the precursor composition ratio (TMCS:TEOS) of 10:90, 25:75, 50:50, 75:25, and 90:10 and then calcined at various temperatures. The TMCS‐TEOS silica thin layer has a significant influence on the surface hydrophobicity of the glass. The higher the number of TMCS precursors, the greater the contact angle produced. The highest contact angle produced was 98° at a TMCS‐TEOS ratio of 75:25 and without calcination. The TMCS‐TEOS silica thin layer contact angle decreased with increasing calcination temperature. The hydrophobicity of the TMCS‐TEOS silica thin layer could withstand temperatures up to 300°C. Quantitative analysis of FTIR spectra's peak area shows that with the increasing TMCS, the ratio of silanol/siloxane decreases. Gas sorption analysis shows that the TMCS‐TEOS thin layers' pore sizes are in the mesoporous region, and the pore shapes are cylindrical at all TMCS:TEOS ratios and calcination temperatures.

中文翻译：

---

使用原硅酸四乙酯（TEOS）和三甲基氯硅烷（TMCS）前体用疏水性二氧化硅薄层修饰玻璃表面

疏水性二氧化硅层的合成采用溶胶-凝胶法，通过使二氧化硅前体三甲基氯硅烷（TMCS）和原硅酸四乙酯（TEOS）反应，前体组成比（TMCS：TEOS）的差异为10：90、25：75、50 ：50、75：25和90:10，然后在各种温度下煅烧。TMCS-TEOS二氧化硅薄层对玻璃的表面疏水性有很大影响。TMCS前体的数量越多，产生的接触角越大。在TMCS-TEOS比为75:25且未煅烧的情况下，产生的最大接触角为98°。TMCS-TEOS二氧化硅薄层接触角随煅烧温度的升高而减小。TMCS-TEOS二氧化硅薄层的疏水性可以承受高达300°C的温度。FTIR光谱的定量分析 s峰面积表明，随着TMCS的增加，硅烷醇/硅氧烷的比例降低。气体吸附分析表明，TMCS‐TEOS薄层的孔径在中孔区域，并且在所有TMCS：TEOS比和煅烧温度下，孔的形状均为圆柱形。