WO₃ films with thicknesses between 550 and 853 nm were deposited on glass substrates using the electron beam evaporation method at room temperature. The microstructures and surface roughness of the films were studied by X-ray diffraction (XRD) and atomic force microscopy (AFM). It was observed that the crystalline structure of the WO₃ thin films significantly changes from the amorphous to crystalline states with a crystalline texture, and the mosaicity and grain size dependent on the film thickness. The transmittance spectra of the obtained WO₃ films were measured in the range from 340 to 850 nm, and the Swanepoel method was used to determine the refractive indices and the thicknesses of the WO₃ films. The obtained optical functions reveal the highly homogeneous structure of the films.

使用电子束蒸发方法在室温下将厚度介于550和853 nm之间的WO ₃膜沉积在玻璃基板上。通过X射线衍射（XRD）和原子力显微镜（AFM）研究了薄膜的微观结构和表面粗糙度。观察到，WO ₃薄膜的晶体结构从非晶态到具有晶体织构的晶态显着变化，并且镶嵌性和晶粒尺寸取决于膜厚度。在340至850nm的范围内测量获得的WO ₃膜的透射光谱，并且使用Swanepoel方法确定WO ₃的折射率和厚度。电影。所获得的光学功能揭示了膜的高度均匀的结构。