In recent years, mid-infrared window is steadily growing popularity due to the development of mid-infrared technology. Mid-infrared antireflection coating with UV–vis-shortwave near infrared cut-off is critical important in the infrared detector, which can improve quality of signal in mid-infrared and avoid noise introduced by non-working wavelength band. Based on electron beam evaporation technique with argon plasma assistance, a mid-infrared antireflection coating with UV–vis-shortwave near infrared cut-off on oxyflouride substrate, has been designed, fabricated and characterized. The coating on the first side of substrate is composed of 7-layer alternative stacking high-index layer of germanium and low-index coating material of magnesium fluoride. The coating on the second side of substrate is composed of 2-layer alternative stacking high-index layer of alumina and low-index coating material of silicon oxide. This coating shows below 1% average transmittance from 300 nm to 900 nm and above 92 % average transmittance from 3.7 um to 4.8 um in mid-infrared region. The error analysis shows that thickness errors are the main reasons for the deviations between theoretical design and experimental results. In addition, the adhesion strength of the coating is quantitatively characterized by scratch-adhesion test.

近年来，由于中红外技术的发展，中红外窗口稳步增长。具有紫外-可见-短波近红外截止功能的中红外抗反射涂层在红外探测器中至关重要，它可以提高中红外的信号质量并避免非工作波段引入的噪声。基于电子束蒸发技术和氩等离子体辅助技术，设计，制造和表征了在氟氟化物衬底上具有紫外-可见-短波近红外截止的中红外减反射膜。基材第一面上的涂层由7层交替堆叠的高折射率锗层和低折射率氟化镁涂层材料组成。基板第二面上的涂层由两层交替堆叠的氧化铝高折射率层和氧化硅低折射率涂层材料组成。该涂层在中红外区域的300 nm至900 nm范围内平均透射率低于1％，在3.7 um至4.8 um范围内平均透射率高于92％。误差分析表明，厚度误差是导致理论设计与实验结果存在偏差的主要原因。另外，涂层的粘合强度通过刮擦粘合试验定量表征。误差分析表明，厚度误差是导致理论设计与实验结果存在偏差的主要原因。另外，涂层的粘合强度通过刮擦粘合试验定量表征。误差分析表明，厚度误差是导致理论设计与实验结果存在偏差的主要原因。另外，涂层的粘合强度通过刮擦粘合试验定量表征。