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Frequency Response of C–V and G/ω-V Characteristics of Au/(Nanographite-doped PVP)/ n -Si Structures
Journal of Materials Science: Materials in Electronics ( IF 2.8 ) Pub Date : 2020-11-21 , DOI: 10.1007/s10854-020-04875-6
Ahmet Muhammed Akbaş , Osman Çiçek , Şemsettin Altındal , Y. Azizian-Kalandaragh

This paper reports that frequency response on profile of C–V–ƒ and G/ω–V–ƒ characteristics of spin-coated nanographite (NG)-doped polyvinylpyrrolidone (PVP)/n-Si structures in a wide frequency (1 kHz–5 MHz) and voltage (± 3 V) ranges at room temperature. Hereby, the basic parameters of the structure such as diffusion potential (VD), doping donor density (ND), Fermi energy level (EF), maximum electric field (Em), depletion layer thickness (Wd), and barrier height (ΦB) are derived by using the intercept and slope of C−2–V–ƒ plot for each frequency. Additionally, the energy density distribution of surface states (Nss) and their relaxation time values (τ) are also attained from the conduction method and their values are found as 4.999 × 1012 eV−1 cm−2 and 2.92 µs at 0.452 eV, and 3.857 × 1012 eV−1 cm−2 and 164 µs at 0.625 eV, respectively. The lower Nss values are the consequence of passivation effect of the used nanographite (NG)-PVP polymer interlayer. As a result, the polymer interlayer based nanographite (NG)-PVP is candidate instead of the widely used oxide/insulator layer for the purpose of decreasing the surface states or dislocations.



中文翻译:

Au /(纳米石墨掺杂PVP)/ n-Si结构的C–V频率响应和G /ω-V特性

本文报道了在很宽的频率范围内(1 kHz–m),旋涂纳米石墨(NG)掺杂的聚乙烯吡咯烷酮(PVP)/ n-Si结构的C–V–ƒ和G / ω–V–ƒ特性曲线的频率响应。在室温下为5 MHz)和电压(±3 V)范围。因此,该结构的基本参数,例如扩散电势(V D),掺杂施主密度(N D),费米能级(E F),最大电场(E m),耗尽层厚度(W d)和势垒高度(Φ)通过使用C的截距和斜率导出-2每个频率的–V–ƒ图。另外,还可以通过传导方法获得表面态的能量密度分布(N ss)及其弛豫时间值(τ),在0.452 eV时,其值为4.999×10 12  eV -1  cm -2和2.92 µs。在0.625 eV时分别为3.857×10 12  eV -1  cm -2和164 µs。较低的N ss值是所用纳米石墨(NG)-PVP聚合物中间层钝化效果的结果。结果,出于减少表面状态或位错的目的,基于聚合物中间层的纳米石墨(NG)-PVP代替了广泛使用的氧化物/绝缘体层是候选者。

更新日期:2020-11-22
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