当前位置: X-MOL 学术Acta Biomater. › 论文详情
Our official English website, www.x-mol.net, welcomes your feedback! (Note: you will need to create a separate account there.)
Atomic layer deposition on dental materials: Processing conditions and surface functionalization to improve physical, chemical, and clinical properties - A review
Acta Biomaterialia ( IF 9.7 ) Pub Date : 2020-11-21 , DOI: 10.1016/j.actbio.2020.11.024
Sarah Hashemi Astaneh , Leonardo P. Faverani , Cortino Sukotjo , Christos G. Takoudis

Surface functionalization is an effective approach to improve and enhance the properties of dental materials. A review of atomic layer deposition (ALD) in the field of dental materials is presented. ALD is a well-established thin film deposition technique. It is being used for surface functionalization in different technologies and biological related applications. With film thickness control down to Ångström length scale and uniform conformal thin films even on complex 3D substrates, high quality thin films and their reproducibility are noteworthy advantages of ALD over other thin film deposition methods. Low temperature ALD allows temperature sensitive substrates to be functionalized with high quality ultra-thin films too. In the current work, ALD is elaborated as a promising method for surface modification of dental materials. Different aspects of conventional dental materials that can be enhanced using ALD are discussed. Also, the influence of different ALD thin films and their microstructure on the surface properties, corrosion-resistance, antibacterial activity, biofilm formation, and osteoblast compatibility are addressed. Depending on the stage of advancement for the studied materials reported in the literature, these studies are then categorized into four stages: fabrication & characterization, in vitro studies, in vivo studies, and human tests. Materials coated with ALD thin films with potential dental applications are also presented here and they are categorized as stage 1. The purpose of this review is to organize and present the up to date ALD research on dental materials. The current study can serve as a guide for future work on using ALD for surface functionalization and resulting property tuning of materials in real world dental applications.



中文翻译:

牙科材料上的原子层沉积:加工条件和表面功能化,以改善物理,化学和临床特性-评论

表面官能化是改善和增强牙科材料性能的有效方法。本文介绍了牙科材料领域的原子层沉积(ALD)。ALD是一种成熟的薄膜沉积技术。它被用于不同技术和生物相关应用中的表面功能化。即使在复杂的3D基板上,薄膜厚度控制可降至Ångström长度,并且均匀的保形薄膜,与其他薄膜沉积方法相比,高质量的薄膜及其可重复性是ALD的显着优势。低温ALD允许温度敏感的基材也可以使用高质量的超薄膜进行功能化。在当前的工作中,ALD被阐述为一种用于牙科材料表面改性的有前途的方法。讨论了可以使用ALD增强的常规牙科材料的不同方面。此外,解决了不同的ALD薄膜及其微观结构对表面性能,耐腐蚀性,抗菌活性,生物膜形成和成骨细胞相容性的影响。根据文献中报道的研究材料的发展阶段,这些研究可分为四个阶段:制造和表征,体外研究,体内研究和人体试验。本文还介绍了可能在牙科领域应用的涂有ALD薄膜的材料,并将它们归类为第1阶段。此综述的目的是组织和介绍有关牙科材料的最新ALD研究。

更新日期:2021-01-28
down
wechat
bug