Abstract It is proposed that the pursuit of optimal parameters for the synthesis of TiN thin films by reactive sputtering can be simplified by implementing plasma optical emission spectroscopy in real time. Emission from Ti and neutral and ionized species of Ar and N2 were obtained at different deposition conditions such as supplied power and gasses flow ratios. Thin films were characterized by X-ray photo-electron spectroscopy to determine their composition and the predominant component was found to be TiN; however, the larger N2/Ar flow ratio, the more oxygen inclusion in the films. Multivariate statistical analysis was performed to determine the relation between the film composition and plasma optical emission spectroscopy results.

中文翻译：

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等离子体发射光谱作为通过反应磁控溅射监测 TiNx 沉积的工具

摘要 提出通过实时实施等离子体发射光谱可以简化对反应溅射合成 TiN 薄膜的最佳参数的追求。在不同的沉积条件（例如供应的功率和气体流量比）下获得 Ti 以及中性和电离物种的 Ar 和 N2 的发射。薄膜通过 X 射线光电子能谱表征以确定其成分，发现主要成分是 TiN；然而，N2/Ar 流量比越大，薄膜中包含的氧越多。进行多变量统计分析以确定膜组成与等离子体光学发射光谱结果之间的关系。