Abstract Graphene as a promising 2D material has been widely studied due to its unique properties. Transferring CVD graphene to other substrates from its original metal foil is important for its practical application. However, the removal of PMMA that is commonly used as the supporting mediator during the transferring process is troublesome, because PMMA molecules disturb the essential properties of graphene and conventional acetone treatment fails to completely remove PMMA from graphene surface. Thermal annealing treatments are earliest to be put into cleaning PMMA residues, while plasma and ion beam treatment generally have a higher cleaning efficiency. Light treatment is relatively mild compared to other techniques, and relies on the interaction between specific material and contaminants. Mechanical treatments can simply reach significant cleaning effect and enjoy a bright future. In this review, we summarize the current methods to reduce PMMA residues in detail, and their mechanisms behind are discussed systematically.

中文翻译：

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消除石墨烯上PMMA残留的方法——超洁净石墨烯

摘要 石墨烯作为一种很有前途的二维材料，由于其独特的性质而被广泛研究。将 CVD 石墨烯从其原始金属箔转移到其他基板对其实际应用很重要。然而，在转移过程中去除通常用作支撑介质的 PMMA 很麻烦，因为 PMMA 分子会干扰石墨烯的基本性质，而常规的丙酮处理无法从石墨烯表面完全去除 PMMA。热退火处理最早用于清洁PMMA残留物，而等离子体和离子束处理一般具有更高的清洁效率。与其他技术相比，光处理相对温和，并且依赖于特定材料和污染物之间的相互作用。机械处理可以简单地达到显着的清洁效果，享受光明的未来。在这篇综述中，我们详细总结了目前减少 PMMA 残留的方法，并系统地讨论了它们背后的机制。