The landscape of block copolymer (BCP) lithographic patterning has evolved significantly from the early days of the first generation BCP material, poly(styrene)-block-poly(methyl methacrylate) (PS-b-PMMA). The low Flory–Huggins interaction parameter (χ) of the workhorse material PS-b-PMMA prevents ultra-low dimensional scaling (<20 nm), which is the lifeblood of the semiconductor industry. In recent years, this bottleneck has been circumvented through the precise engineering of novel BCPs possessing either high χ and low polymerization degree (N) values or complex macromolecular architectures. We provide a synopsis of recently engineered BCP materials, examining the synthetic routes employed and thin film processing used for nanolithography. Fruitful results emanating from silicon and fluorine containing BCPs are emphasized as they provide a promising platform for sub-10 nm scaling. We subsequently examine routes to continue the relentless scaling for logic technologies with a focus on the potential integration of “advanced” BCP architectures in nanomanufacturing.

中文翻译：

---

工程嵌段共聚物材料，用于对超低尺寸进行构图

嵌段共聚物（BCP）光刻构图的景观已经从第一代BCP材料的初期显著发展而来的，聚（苯乙烯） -嵌段-聚（甲基丙烯酸甲酯）（PS- b -PMMA）。主力材料PS- b -PMMA的低Flory-Huggins相互作用参数（χ）可防止超低尺寸缩放（<20 nm），这是半导体行业的命脉。近年来，这一瓶颈已通过对具有高χ和低聚合度（N）值或复杂的大分子结构。我们提供了最近设计的BCP材料的简介，研究了用于纳米平版印刷的合成路线和薄膜处理。强调了含硅和氟的BCP所产生的丰硕成果，因为它们为10纳米以下的缩放提供了有希望的平台。随后，我们研究了继续进行逻辑技术无休止扩展的路线，重点是纳米制造中“先进的” BCP体系结构的潜在集成。