Abstract

Nanocrystalline iridium coatings on hafnium carbide and tantalum carbide substrates are prepared by chemical vapor deposition (MOCVD) at 600°С. Subsequent high-temperature treatment at 1100°С gives rise to chemical reactions between iridium and hafnium carbide or tantalum carbide to yield nanosized substitutional intermetallic solid solutions MIr_3 – x and evolve free carbon. The occurrence of intermetallic interaction is proved by X-ray photoelectron (XPS) spectroscopy.

中文翻译：

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碳化Ha和碳化钽上铱相的化学气相沉积

摘要

碳化ha和碳化钽基材上的纳米晶铱涂层是通过在600°C下化学气相沉积（MOCVD）制备的。随后的1100°С高温处理引起铱与碳化and或碳化钽之间的化学反应，生成纳米级替代金属间金属固溶体MIr _{3-  x}并释放出游离碳。X射线光电子能谱（XPS）证明了金属间相互作用的发生。