Abstract

The interaction of thin Ti–B–N films obtained by magnetron reactive sputtering of a TiB₂ target was studied in an atmosphere of a gas argon–nitrogen mixture (85 vol % Ar + 15 vol % N₂), with mineral acids (HCl, H₂SO₄, H₃PO₄, HNO₃). It was found that the hexagonal boron nitride formed during the deposition process, along with titanium nitride, forms a resistant protective film that protects the bulk (~85%) of the film from corrosion.

中文翻译：

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反应磁控溅射在Ti–B–N薄膜的无机酸溶液中的腐蚀

摘要

在气体氩氮混合气体（85体积％Ar + 15体积％N ₂）与无机酸（HCl）气氛中研究了通过磁控反应溅射TiB ₂靶获得的Ti-B-N薄膜的相互作用。，H ₂ SO ₄，H ₃ PO ₄，HNO ₃）。发现在沉积过程中形成的六方氮化硼与氮化钛一起形成了一种耐腐蚀的保护膜，可以保护膜的大部分（〜85％）免受腐蚀。