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Fabrication of ultra-flat c-axis oriented ZnO thin films on atomically stepped cyclo-olefin polymer (COP) substrates by pulsed laser deposition at RT
Japanese Journal of Applied Physics ( IF 1.5 ) Pub Date : 2020-11-14 , DOI: 10.35848/1347-4065/abc65e
Tomoaki Oga 1 , Shiori Yamada 1 , Naho Kaneko 1 , Satoru Kaneko 1, 2 , Akifumi Matsuda 1 , Mamoru Yoshimoto 1
Affiliation  

Highly crystalline c-axis oriented ZnO thin films with ultra-flat surfaces were fabricated by pulsed laser deposition at RT on 0.3 nm high atomically stepped cyclo-olefin polymer (COP) substrates whose surfaces were thermally nanoimprinted using atomically stepped sapphire molds. X-ray diffraction and atomic force microscopy measurements showed that the atomically-controlled surfaces of COP substrates enhanced the c-axis orientation and surface flatness of the crystalline ZnO thin films. The ZnO thin films grown on the atomically stepped COP substrates exhibited atomically stepped surface morphology, and also the optical bandgap of about 3.3eV and RT resistivity of 5.0נ10−2 Ω cm.



中文翻译:

在室温下通过脉冲激光沉积在原子阶梯式环烯烃聚合物(COP)基底上制备超平坦c轴取向ZnO薄膜

通过在室温下在0.3 nm高原子台阶环烯烃聚合物(COP)基板上进行脉冲激光沉积,在其表面通过原子台阶蓝宝石模具进行热纳米压印的情况下,制备了具有超平整表面的高度结晶c轴取向ZnO薄膜。X射线衍射和原子力显微镜测量表明,COP衬底的原子控制表面增强了晶体ZnO薄膜的c轴取向和表面平坦度。生长在原子台阶COP基板上的ZnO薄膜表现出原子台阶的表面形态,并且也为约5.0נ10 3.3eV和RT的电阻率的光学带隙-2 Ω厘米。

更新日期:2020-11-14
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