We review the history in connection with the resolution formula of microlithography and argue that it was Abbe rather than Rayleigh who definitively stated the 0.5λNA resolution limit for the minimum pitch first, using an approach more relevant to projection imaging, and hence, this expression should be more appropriately referred to as the Abbe formula for the resolution of a projection imaging system.

中文翻译：

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瑞利还是阿贝？微光刻分辨率公式的由来和命名

我们回顾了与微光刻分辨率公式有关的历史，认为是阿贝而不是瑞利首先使用与投影成像更相关的方法明确规定了最小间距的0.5λNA分辨率极限，因此，该表达式应更适合地称为投影成像系统的分辨率的阿贝公式。