Formation and stability of W coating on a flexible polyimide substrate In this paper, the effect of photon annealing and cryogenic treatment on the structure, adhesion, and electrical resistivity of W coatings is investigated. The W coating was deposited on a flexible polyimide (PI) substrate by dual magnetron sputtering at various deposition powers from 0.5 to 1.6 kW. The synthesized W coatings were subjected to photonic annealing in vacuum (t = 300 °С) and cryogenic treatment in liquid nitrogen (t = -190 °С). In the as-deposition state, the coating consists of an α-structure with a body-centered cubic lattice and a strong (110) texture. However, at a spray power of 0.5 kW, there are mixed α- and β- phases. The β- to α- W phase transition occurs after photon annealing. The deposited coating W consists of a columnar structure and an increase in the spray power leads to a change in the density of the microstructure. Photonic annealing leads to a change in the shape and size of the grain, which leads to a change in electrical resistivity. Treatment of the resulting coating with liquid nitrogen does not affect the microstructure and electrical resistivity. Exposure to high temperature and liquid nitrogen does not degrade the adhesion strength of the W coating to the PI substrate.

中文翻译：

---

柔性聚酰亚胺基板上 W 涂层的形成和稳定性

W 涂层在柔性聚酰亚胺基板上的形成和稳定性 在本文中，研究了光子退火和低温处理对 W 涂层的结构、附着力和电阻率的影响。W 涂层通过双磁控溅射以 0.5 至 1.6 kW 的各种沉积功率沉积在柔性聚酰亚胺 (PI) 基板上。合成的 W 涂层在真空（t = 300°С）中进行光子退火和在液氮中进行低温处理（t = -190°С）。在沉积状态下，涂层由具有体心立方晶格和强 (110) 织构的 α 结构组成。然而，在 0.5 kW 的喷雾功率下，存在混合的 α 相和 β 相。β- 到 α-W 相变发生在光子退火之后。沉积涂层 W 由柱状结构组成，喷雾功率的增加导致微观结构密度的变化。光子退火导致晶粒形状和尺寸的变化，从而导致电阻率的变化。用液氮处理所得涂层不会影响微观结构和电阻率。暴露在高温和液氮中不会降低 W 涂层对 PI 基材的粘附强度。