Abstract Pulsed laser deposition technique was used to produce Zn/ZnO thin film and Ag/Zn/ZnO thin film by ablation of Zn metal with and without Ag metal in the evacuated chamber, respectively. The developing in the structure of Zn/ZnO thin film was carried by making an ablation of both metals at the same time, which helped to enhance the nonlinearity properties due to the local effect of Ag atoms and its nonlinearity property. The change of physicochemical properties after embedding the Zn/ZnO thin film with Ag layer was performance via X-ray diffraction, energy-dispersive X-ray spectroscopy, and UV-visible spectrophotometer, which illustrated the varying of their crystallinity, their elemental analysis, and their energy bandgap of the prepared samples. After that, an open and closed aperture Z-scan technique was used to determine the nonlinear absorption coefficient, nonlinear reflection coefficient, and the third-order nonlinearity susceptibility at 532 nm. Based on these calculations, the Ag/Zn/ZnO thin film could be considered as a promising material in the photonic applications.

中文翻译：

---

脉冲激光沉积技术制备的Ag/Zn/ZnO纳米复合薄膜的线性和非线性光学研究

摘要 采用脉冲激光沉积技术，在真空室中分别在有和无银金属的情况下烧蚀金属锌，制备Zn/ZnO薄膜和Ag/Zn/ZnO薄膜。Zn/ZnO薄膜结构的发展是通过同时烧蚀两种金属来进行的，这有助于增强由于Ag原子的局部效应及其非线性特性引起的非线性特性。Zn/ZnO薄膜包埋Ag层后理化性质的变化是通过X射线衍射、能量色散X射线光谱和紫外可见分光光度计表现出来的，说明了它们的结晶度、元素分析、及其制备样品的能带隙。之后，使用开闭孔径 Z 扫描技术确定非线性吸收系数、非线性反射系数和 532 nm 处的三阶非线性磁化率。基于这些计算，Ag/Zn/ZnO 薄膜可以被认为是光子应用中很有前途的材料。