Abstract In this work, the method of etching the metal-ion-implanted dielectric via a patterned electron beam (EB) resist mask was used to fabricate the metal/glass nanocomposite arrays with prospective applications. Following the method, the Au/SiO2 nanocomposite arrays with an expected square grid of 600 nm periodicity (50% in the duty cycle) were fabricated. Experimental results revealed that the fabricated arrays presented a better diffractive performance compared with the unimplanted silica glass array. Subsequently, the diffraction characteristics of the corresponding one-dimensional Au/SiO2 nanocomposite arrays were numerically simulated. The calculated results showed that the diffraction efficiency of the Au/SiO2 nanocomposite array was influenced by the distribution depth and volume fraction of nanocomposites, which could be improved significantly by optimizing the parameters of the Au/SiO2 nanocomposite.

中文翻译：

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二维Au/SiO2纳米复合阵列的制备及其衍射特性

摘要 在这项工作中，通过图案化电子束 (EB) 抗蚀剂掩模蚀刻金属离子注入的电介质的方法用于制造具有前瞻性应用的金属/玻璃纳米复合阵列。按照该方法，制造了具有 600 nm 周期性（占空比为 50%）的预期方形网格的 Au/SiO2 纳米复合阵列。实验结果表明，与未植入的石英玻璃阵列相比，制造的阵列具有更好的衍射性能。随后，数值模拟了相应的一维 Au/SiO2 纳米复合阵列的衍射特性。计算结果表明，Au/SiO2纳米复合材料阵列的衍射效率受纳米复合材料分布深度和体积分数的影响，