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Lithographic Patterning and Selective Functionalization of Metal Nanoparticle Composite Films
ACS Applied Electronic Materials ( IF 4.7 ) Pub Date : 2020-11-02 , DOI: 10.1021/acsaelm.0c00770
Hendrik Schlicke 1 , Sophia C. Bittinger 2 , Tobias Vossmeyer 2
Affiliation  

Due to their tunneling-based charge transport mechanism, gold nanoparticle (GNP) composites attract significant interest for applications as resistive sensors for strain and volatile organic compounds. Here, we present a facile method for patterning and re-functionalization of alkanedithiol cross-linked GNP thin films based on deep ultraviolet photolithography. A lift-off process using a sacrificial layer of polymethyl methacrylate (PMMA) was used in combination with a rapid, spin-coating-based GNP film deposition procedure to fabricate patterned GNP films. Furthermore, PMMA mask layers were utilized for selective molecular doping of individual GNP film chemiresistors in a chemiresistor array with different ligand molecules, leading to altered chemical selectivities. The methods presented in this work are suitable for patterning organically cross-linked GNP films for various sensing applications as well as the fabrication of electronic noses based on GNP film chemiresistor arrays. Due to the photolithographic approach, the deposition and re-functionalization methods outlined in this paper are easily scalable, in contrast to serial techniques such as ink-jet printing or microdispensing.

中文翻译:

金属纳米颗粒复合膜的光刻图案化和选择性功能化

由于其基于隧穿的电荷传输机制,金纳米颗粒(GNP)复合材料作为应变和挥发性有机化合物的电阻传感器引起了广泛的关注。在这里,我们提出了一种基于深紫外光刻技术对链烷二酚交联的GNP薄膜进行图案化和重新功能化的简便方法。使用使用聚甲基丙烯酸甲酯(PMMA)牺牲层的剥离工艺,结合基于旋涂的快速GNP膜沉积步骤来制作图案化的GNP膜。此外,PMMA掩膜层被用于在具有不同配体分子的化学电阻阵列中对单个GNP膜化学电阻进行选择性分子掺杂,从而导致化学选择性改变。这项工作中介绍的方法适用于构图用于各种传感应用的有机交联GNP膜,以及适用于基于GNP膜化学电阻器阵列的电子鼻的制造。由于采用光刻方法,与诸如喷墨打印或微分配等串行技术相比,本文概述的沉积和重新功能化方法易于扩展。
更新日期:2020-11-25
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